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An Atomic Layer Deposition Approach to Controlling the Shape Profiles of Nanostructures Deposited Inside Nanoporous Materials (ISR IP)

ISR intellectual property available to license

Inventors:
Ray Adomaitis

For more information
If you would like to license this intellectual property, have questions, would like to contact the inventors, or need more information, contact ISR External Relations Director Jeff Coriale at coriale@umd.edu or 301.405.6604.

Find more ISR IP
You can go to our main IP search page to search by research category or faculty name. Or view the entire list of available IP on our complete IP listing page.

ISR-IP-Adomaitis ISR-IP-nano

Related Articles:
A Method for Determining the Nearest Uniformity Producing Profile (NUPP) for the Control of Thin-Film Processing Systems with Wafer Rotation (ISR IP)
Segmented Reactor Showerhead Design with Exhaust Gas Recirculation and Spatially-Resolved Sensing Capability for Chemical Vapor Deposition, Plasma-Enhanced CVD, and Plasma Etch Processes (ISR IP)
A Computational Algorithm for Solar Reflector Optimization with Novel Applications in Concentrating Photovoltaic Solar Collector Design (ISR IP)
A Flexible, High Specific Energy Density, Rechargeable Battery (ISR IP)
Micro Fluidic Device that Allows 3 Dimensional Control of Nano and Micro Particles by Electroosmotic Flow (EOF) Actuation (ISR IP)
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Lateral Two-Terminal Nanotube Devices and Method for their Formation (ISR IP)
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Controlled Electromechanical Deposition of Polysaccaride Film and Hydrogel and Materials Formed Therefrom (ISR IP)
Assembly of Chitosan onto an Electrode Surface (ISR IP)

June 24, 2007


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