Robust Nonlinear Control of a Rapid Thermal Processor

J.S. Baras and N.S. Patel,

13th International Conference on Chemical Vapor Deposition (CVD-XIII), Los Angeles, CA, May 5-10, 1996

Abstract

This paper presents application of robust multvariable nonlinear control to the temperature control problem for rapid thermal processing systems. The controller designed achieves good tracking and temperature uniformity for a wide range of processing conditions.