ISR research accomplishments

CVD Reactor Modeling and Parameter Identification

Research team

Raymond A. Adomaitis (ChE/ISR)
Hsiao-Yung Chang
Gary W. Rubloff (MNE/ISR)
John N. Kidder, Jr. (MNE/ISR)

Accomplishment

A validated simulator was developed to predict true wafer temperature as a function of reactant gas composition and other process operating conditions for a commercial CVD reactor system.

There was rapid development of a fully 3D gas temperature/wafer thermal dynamics model using the MWRtools methods. Nonlinear identification methods were developed for a subset of model parameters. We experienced excellent agreement between simulator predictions and measured wafer temperature over a range of operating conditions. There was experimental confirmation of previous theoretical predictions.

For more information

ISR Technical Report | 98-28 |

H.-Y. Chang, and R.A. Adomaitis, ”Analysis of Heat Transfer in a CVD reactor," Int. J. Heat Fluid Flow, 230 (1999) 74-83.

H.-Y. Chang, R.A. Adomaitis, J.N. Kidder, Jr., and G.W. Rubloff, “Influence of Gas Composition of Wafer Temperature in a W CVD Reactor,” J. Vac. Sci. & Tech. (2000) submitted.