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Adomaitis research group publications
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Adomaitis, R. A. ``Development of a Lattice Monte Carlo Simulator for Atomic Layer Deposition of Al2O3,''
Submitted for publication (2009). | |
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Adomaitis, R. A. ``Development of a Multiscale Model for an Atomic Layer Deposition Process,''
Submitted for publication (2009). | |
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Guglietta, G. T. Wanga, R. Pati, S. Ehrman, and R. A. Adomaitis ``Chemical Vapor Deposition of Copper Oxide Films for Photoelectrochemical Hydrogen
Production,'' Proc. of SPIE Vol. 7408 740807-1, Solar Hydrogen and Nanotechnology IV, F. Osterloh, Ed. (2009). | |
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Dwivedi, V. and R. A. Adomaitis ``Multiscale Simulation and Optimization of an Atomic Layer Deposition Process in a Nanoporous Material,''
ECS Transactions 25 (2009) 115-122, 10.149/1.3207582. | PDF |
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Leon, M. del Pilar and R. A. Adomaitis ``Full Wafer Mapping and Response Surface Modeling Techniques for Thin Film Deposition Processes,''
J. Crystal Growth 311 (2009) 3399-3408. | PDF
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Oliver, J. D., B. H. Ponczak, R. P. Parikh, and R. A. Adomaitis ``Uniformity Improvement of Planetary Epitaxial Growth Processes through Analysis of
Intentionally Stalled SiC Wafers,'' Mat. Sci. Forum, 615-617 (2009) 101-104.
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Adomaitis, R. A. ``The Nearest Uniformity Producing Profile (NUPP) Optimization
Criterion for Thin-Film Processing Applications,'' J. Process Control 18 (2008) 922-930.
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Sreenivasan, R., R. A. Adomaitis, and G. W. Rubloff ``A Comparative Study of
Reactor Designs for the Production of Graded Films with Applications to
Combinatorial CVD,'' J. Crystal Growth 310 (2008) 270-283.
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Adomaitis, R. A. ``Intentionally Patterned and Spatially Non-Uniform Film Profiles
in Chemical Vapor Deposition Processes,'' Surface and Coatings Technology
201 (2007) 9025-9029.
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Cai, Y., L. Henn-Lecordier, G. W. Rubloff, R. Sreenivasan, J.-O. Choo, and R. A. Adomaitis,
``Multiplexed Mass Spectrometric Sensing in a Spatially Programmable Chemical
Vapor Deposition System,'' J. Vac. Sci. Tech. B 25 (2007) 1288-1297.
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Adomaitis, R. A., I. G. Kevrekidis, and R. de la Llave,
``A Computer-Assisted Study of Global Dynamic Transitions for a
Non-Invertible System,'' Int. J. Bifurcation Chaos 17 (2007) 1305-1321.
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Adomaitis, R. A. ``The Trouble with Spurious Eigenvalues,''
Int. J. Bifurcation Chaos 17 (2007) 1375-1381.
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Parikh, R. P., R. A. Adomaitis, J. D. Oliver, and B. H. Ponczak ``Implementation of a
Geometrically-based Criterion for Film Uniformity Control in a Planetary SiC CVD
Reactor System,'' J. Process Control 17 (2007) 477-488.
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Parikh, R. P., R. A. Adomaitis, M. E. Aumer, D. Partlow, D. Thomson, and G. W. Rubloff
``Validating Gallium Nitride Growth Kinetics Using a Precursor Delivery Showerhead
as a Novel Chemical Reactor,'' J. Crystal Growth 296 (2006) 15-26.
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Sreenivasan, R. R. A. Adomaitis, and G. W. Rubloff
``A Demonstration of Spatially Programmable Chemical Vapor Deposition:
Model-Based Uniformity/Non-uniformity Control.''
J. Vac. Sci. Tech. B 24 (2006) 2706-2715.
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Chen, J. and R. A. Adomaitis ``An Object-Oriented Framework for Modular Chemical Process
Simulation with Semiconductor Processing Applications,'' Computers & Chem. Eng,
30 (2006) 1354-1380.
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Parikh, R. P. and R. A. Adomaitis ``An Overview of Gallium Nitride Growth Chemistry and
its Effect on Reactor Design: Application to a Planetary Radial-Flow CVD System,''
J. Crystal Growth 286 (2006) 259-278.
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Cho, S. G. W. Rubloff, M. E. Aumer, D. B. Thomson, D. P. Partlow, R. Parikh, and
R. A. Adomaitis ``In-situ Chemical Sensing in AlGaN/GaN HEMT MOCVD Process for
Real-Time Prediction of Product Crystal Quality and Advanced Process Control,'' J. Vac. Sci. Tech.
B 23 (4) (2005) 1386-1397.
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Choo, J. O., R. A. Adomaitis, L. Henn-Lecordier, Y. Cai, and
G. W. Rubloff ``Development of a Spatially Controllable Chemical Vapor Deposition Reactor
with Combinatorial Processing Capabilities,'' Review of Scientific Instruments, 76,
062217 (2005).
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Adomaitis, R. A. ``Identification of a Deposition Rate Profile Subspace Corresponding
to Spatially-Uniform Films in Planetary CVD Reactors: A New Criterion for Uniformity
Control,'' Computers & Chem. Eng, 29 (2005) 829-837.
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Choo, J. O., R. A. Adomaitis, G. W. Rubloff, L. Henn-Lecordier, and Y.
Liu ``Simulation-Based Design and Experimental Evaluation of a
Spatially Controllable Chemical Vapor Deposition Reactor,'' AIChE Journal,
51 (2005) 572-584.
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Adomaitis, R. A. ``A Reduced-Basis Discretization Method for Chemical
Vapor Deposition Reactor Simulation,'' Mathematical
and Computer Modeling, 38 (2003) 159-175.
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Adomaitis, R. A. ``Objects for MWR,'' Computers & Chem. Eng, 26
(2002) 981-998.
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Adomaitis, R. A. ``Spectral Filtering for Improved Performance of Collocation
Discretization Methods,'' Computers & Chem. Eng, 25 (2001)
1621-1632.
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Lin, Y.-h. and R. A. Adomaitis, ``Simulation and Model Reduction Methods for an RF Plasma Glow
Discharge,'' Journal of Computational Physics, 171 (2001) 731-752.
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Chang, H. -Y., R. A. Adomaitis, J. N. Kidder, Jr., and G. W. Rubloff, ``Influence
of Gas Composition on Wafer Temperature in a Tungsten Chemical Vapor
Deposition Reactor: Experimental Measurements, Model Development, and Parameter Estimation,''
J. Vac. Sci. Tech. B, 19 (2001) 230-238; also
ISR TR 2000-09.
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Rico-Martinez, R., R. A. Adomaitis, and I. G. Kevrekidis,
``Noninvertibility in Neural Networks,'' Computers & Chem. Eng, 24 (2000) 2417-2433.
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Adomaitis, R. A. and Y. -h. Lin, ``A Collocation/Quadrature-Based
Sturm-Liouville Problem Solver,'' Applied Math. and Computation, 110
(2000); 205-223; also
ISR TR 99-1.
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Adomaitis, R. A., Y. -h. Lin, and H. -Y. Chang, ``A Computational Framework
for Boundary-Value Problem Based Simulations,'' Simulation, 74 (2000) 28-38.
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Lin, Y. -h., H. -Y.
Chang, and R. A. Adomaitis, ``MWRtools: A Library for Weighted Residual
Method Calculations'' Computers & Chem. Eng, 23 (1999) 1041-1061; also
ISR TR 98-24.
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Theodoropoulou, A.,
E. Zafiriou, and R. A. Adomaitis, ``Inverse Model Based Real-Time Control
for Temperature Uniformity of RTCVD,'' IEEE Trans. Semicond. Manuf., 12 (1999) 87-101.
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Chang, H. -Y. and R.
A. Adomaitis, ``Analysis of Heat Transfer in a Chemical Vapor Deposition
Reactor: An Eigenfunction Expansion Solution Approach,'' Int. J. Heat Fluid
Flow, 20 (1999) 74-83; also
ISR TR 97-84.
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Lin, Y. -h. and R.
A. Adomaitis, ``A Global Basis Function Approach to DC Glow Discharge Simulation,''
Phys. Lett. A, 243 (1998) 142-150; also
ISR TR 97-81.
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Adomaitis, R. A. and
Y. -h. Lin, ``A Technique for Accurate Collocation Residual Calculations,''
Chem. Engng J., 71 (1998) 127-134; also
ISR TR 98-6.
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Theodoropoulou, A.,
R. A. Adomaitis, and E. Zafiriou, ``Model Reduction for RTCVD Optimization,''
IEEE Trans. Semicond. Manuf. 11 (1998) 85-98; also
ISR TR 97-78.
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Research group of Raymond A. Adomaitis
Department of Chemical Engineering and ISR
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