Our research focuses on simulation-based design, optimization, and experimental evaluation of advanced materials manufacturing processes. We are particularly interested in developing new reactor designs for thin-film deposition of semiconductor materials for electronic and solar energy applications.
One of our major areas of activity is in the development of next-generation thin film chemical vapor deposition (CVD) and atomic-layer deposition (ALD) systems. We have developed and tested new reactor design concepts which enable explicit manipulation of the gas-phase composition across the substrate surface during processing, making combinatorial CVD studies and other novel operating modes (including deposition on extremely large substrates) possible. Current work relevant to microelectronic and solar cell manufacturing includes Si CVD, epitaxial growth of III-V compounds, and ALD of metal oxide films.
Important numerical tools developed in our research group in close collaboration with industrial partners include a full-wafer response-surface modeling methodology applicable to the optimization and control of film properties across the entire substrate, and a model-free uniformity control approach based on identifying the Nearest Uniformity Producing Profile (NUPP) for reactor systems with rotating substrates.
Our research is supported by the National Science Foundation, the University of Maryland Energy Research Center, and by industrial partners.